CVD铜基单层氮化硼薄膜

简要描述：Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.

更新时间：2022-06-07
产品型号：
厂商性质：生产厂家
访问量：596

产品咨询联系我们

产品分类

二维材料

钙钛矿/OLED 异质结 MOFS材料其他二维材料二维材料溶液二维材料薄膜二维材料粉末绝缘体黑磷六方氮化硼晶体碲化物晶体硒化物晶体硫化物晶体查看全部产品

详细介绍

Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Monolayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.

Properties of h-BN